Enhanced ICP-MS Triple Quadrupole Technology for Ultra-trace Analysis

Semiconductor wafer fabrication plants and ultra-high purity chemical suppliers can now strengthen their monitoring of trace elements within challenging sample matrices with a new triple quadrupole inductively coupled plasma mass spectrometer (ICP-MS), offering sub-parts-per-trillion detection—making it an ideal solution for ultraclean applications.

Thermo Fisher Scientific
Apr 9, 2018

Semiconductor wafer fabrication plants and ultra-high purity chemical suppliers can now strengthen their monitoring of trace elements within challenging sample matrices with a new triple quadrupole inductively coupled plasma mass spectrometer (ICP-MS), offering sub-parts-per-trillion detection—making it an ideal solution for ultraclean applications.

This innovative system is designed for outstanding productivity with minimal errors—targeting consistent performance and reliable data for routine inspection of ultrapure chemicals and quality control in the wafer fabrication process. The enhanced Thermo Scientific iCAP TQs ICP-MS system, which was introduced in February 2018, is on display at Analytica 2018 (Messe München, booth 101, hall B1) in Munich, Germany.

"There’s a growing need to push the boundaries of detection, especially in the semiconductor industry and related industrial applications," said Miguel Faustino, senior director and general manager, trace elemental analysis, chromatography and mass spectrometry, Thermo Fisher Scientific. "Our enhanced iCAP TQs ICP-MS will enable customers to ensure...

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Enhanced ICP-MS Triple Quadrupole Technology for Ultra-trace Analysis

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