HORIBA Scientific (HORIBA), a global leader in ICP systems, is proud to announce the launch of their new ULTIMA Expert ICP-OES Spectrometer. The ULTIMA Expert combines ease of use, a unique plasma torch design, comprehensive tools, highest resolution, lowest detection limits and full wavelength coverage optics for the most challenging applications.

ULTIMA Expert is designed with a unique plasma torch that offers a radial viewing mode far superior to competitive systems, thanks to the measurement of the entire normal analytical zone. The vertical torch, the original sheath gas device and the wide injector make the ULTIMA Expert more tolerant to difficult matrices, and offer the benefits of robust operation with minimal maintenance.

High resolution and excellent sensitivity allow elements with high, low and trace concentrations to be measured accurately. ULTIMA Expert delivers the highest resolution with less than 5 picometers for the UV range and less than 10 picometers for...

Powerful software, with unique comprehensive tools offers advanced user guidance from sample to results. Image Navigator software provides qualitative and semi-quantitative analysis of unknown samples based on full spectrum acquisition, S3-base and MASTER for facilitated method development, and an uncertainty calculation tool for calibration quality improvement. The Analyst software provides full instrument control and advanced features for method development, analysis and results management.

“The robustness of the ULTIMA Expert makes it ideal for demanding applications such as mining, salt production, wear metals in oil analysis, petrochemical, metallurgical and chemical manufacture,” said Dr. Matthieu Chausseau, ICP Product Manager for HORIBA Scientific. “Its robust performance and comprehensive tools allows the ULTIMA Expert to deliver accurate results faster and easier than any other ICP-OES instrument on the market today.”

The ULTIMA Expert comes with accessories for multiple demanding applications to further enhance its automation and functionality.

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